File:Helium Plasma Jet Process Control - Open Loop vs Closed Loop.webm
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Size of this JPG preview of this WEBM file: 800 × 450 pixels. Other resolutions: 320 × 180 pixels | 640 × 360 pixels | 1,280 × 720 pixels.
Original file (WebM audio/video file, VP8/Vorbis, length 4 min 50 s, 1,280 × 720 pixels, 1.57 Mbps overall, file size: 54.24 MB)
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Summary[edit]
| Description |
English: A helium plasma jet subjected to a process disturbance: a change in the gap distance between the substrate and the jet. At 1:14, the disturbance is actuated without process control ("open loop"); the disturbance is reversed.
At 2:24, the disturbance is actuated WITH PID process control on the optical intensity of the plasma jet, as measured by a photodarlington detector interfaced to an Arduino. At 3:35, the system is stepped through a series of optical intensity setpoint changes. |
| Date | |
| Source | YouTube: Helium Plasma Jet Process Control - Open Loop vs Closed Loop – View/save archived versions on archive.org and archive.today |
| Author | Brandon Curtis |
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This video, screenshot or audio excerpt was originally uploaded on YouTube under a CC license.
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This file is licensed under the Creative Commons Attribution 3.0 Unported license.
Attribution: Brandon Curtis
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This file, which was originally posted to
YouTube: Helium Plasma Jet Process Control - Open Loop vs Closed Loop – View/save archived versions on archive.org and archive.today, was reviewed on 22 January 2019 by reviewer Roy17, who confirmed that it was available there under the stated license on that date.
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 11:01, 11 July 2018 | 4 min 50 s, 1,280 × 720 (54.24 MB) | Vislupus (talk | contribs) | Imported media from https://www.youtube.com/watch?v=EodXQKs5HZA |
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