Category:Photolithography (microfabrication)

Subcategories

This category has the following 3 subcategories, out of 3 total.

Media in category "Photolithography (microfabrication)"

The following 119 files are in this category, out of 119 total.

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  200 nm poly pitch aerial.JPG 361 × 423; 36 KB
  
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  80 nm pitch contact.jpg 250 × 453; 22 KB
  
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  Alternating Phase Shift Mask.svg 336 × 256; 22 KB
  
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  Altpsm.png 321 × 246; 6 KB
  
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  Altpsm.svg 315 × 240; 20 KB
  
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  Attpsm.png 322 × 231; 6 KB
  
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  Autostep i-line stepper.jpg 3,264 × 2,448; 1.93 MB
  
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  Chrome On Glass Mask.svg 339 × 244; 21 KB
  
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  Chromium photomask (details).JPG 3,888 × 2,592; 3.87 MB
  
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  Clean room.jpg 2,247 × 1,742; 2.36 MB
  
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  Cleanroom - photolithography lab (9148324481).jpg 3,872 × 2,592; 4.78 MB
  
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  Cleanroom - photolithography lab (9148355219).jpg 3,872 × 2,592; 5.75 MB
  
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  Cleanroom - photolithography lab (9148355467).jpg 2,592 × 3,872; 3.01 MB
  
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  Cleanroom - photolithography lab (9148355731).jpg 3,872 × 2,592; 4.2 MB
  
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  Cleanroom - photolithography lab (9150555216).jpg 3,872 × 2,592; 3.65 MB
  
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  Cleanroom - photolithography lab (9150555748).jpg 3,872 × 2,592; 3.8 MB
  
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  Cleanroom - photolithography lab (9150584128).jpg 3,872 × 2,592; 4.81 MB
  
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  Cleanroom - photolithography lab (9150584462).jpg 3,872 × 2,592; 5.33 MB
  
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  Cog mask.png 324 × 232; 5 KB
  
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  Collection of United States patents granted to Thomas A. Edison, 1869-1884 (1869) (14569830990).jpg 2,652 × 3,920; 583 KB
  
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  Comparison positive negative tone resist.svg 600 × 300; 27 KB
  
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  DIY UV exposure unit (50959527541).jpg 2,048 × 1,227; 576 KB
  
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  DIY UV exposure unit (50959628232).jpg 2,048 × 1,290; 545 KB
  
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  Double exposure type A.svg 877 × 402; 43 KB
  
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  Double Exposure.JPG 393 × 536; 25 KB
  
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  Dual-Tone Develop.PNG 892 × 576; 26 KB
  
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  Dual-Tone Photoresist.png 907 × 394; 23 KB
  
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  EVG-620 & MA-150 steppers at LAAS (FDLS 2007) 0430.jpg 3,872 × 2,592; 3.73 MB
  
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  EVG-620 & MA-150 steppers at LAAS (FDLS 2007) 0438.jpg 3,872 × 2,592; 4.33 MB
  
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  EVG-620 stepper at LAAS (FDLS 2007) 0440.jpg 2,592 × 3,872; 5.13 MB
  
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  FMIB 36635 Transverse section of lower valve (1); Section of upper valve showing two cavities (2); Upper valve showing the extent of the.jpeg 1,059 × 1,738; 280 KB
  
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  Girls and Nanotechnology.jpg 960 × 540; 41 KB
  
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  Immersion lithography illustration as.svg 433 × 290; 8 KB
  
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  Immersion lithography illustration in hi.svg 433 × 290; 8 KB
  
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  Immersion lithography illustration ml.svg 433 × 290; 8 KB
  
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  Immersion lithography illustration-gu.svg 433 × 290; 8 KB
  
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  Immersion lithography illustration-kn.svg 550 × 272; 7 KB
  
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  Immersion lithography illustration-ne.svg 433 × 290; 6 KB
  
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  Immersion lithography illustration-te.svg 433 × 290; 7 KB
  
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  Immersion lithography illustration.svg 433 × 290; 8 KB
  
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  Immersion lithography.svg 433 × 290; 8 KB
  
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  Immersionlithografie - Auflösungsvorteil.svg 400 × 300; 16 KB
  
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  Immersionlithografie - Verbesserung der Tiefenschärfe.svg 400 × 300; 16 KB
  
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  Immersionslithografie - Lens Showerhead.svg 1,024 × 575; 11 KB
  
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  Immersionslithografie - Verhalten des Kontaktwinkels.svg 1,000 × 500; 17 KB
  
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  Landsat 4 visible Photodiode array.jpg 4,608 × 3,456; 4.62 MB
  
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  Laser lithography writing head and table.JPG 3,888 × 2,592; 3.96 MB
  
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  Laser lithography.jpg 2,449 × 3,205; 4.19 MB
  
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  Lift-off-Verfahren - Ein- und Zweischichtsystem.svg 344 × 322; 19 KB
  
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  Line doubling.JPG 393 × 556; 14 KB
  
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  Line doubling.svg 392 × 555; 4 KB
  
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  Line etch line etch - double line approach DE.svg 877 × 475; 41 KB
  
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  Line etch line etch - trench approach DE.svg 877 × 475; 40 KB
  
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  Lithography Wavelength vs Resolution.PNG 430 × 390; 7 KB
  
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  MA-150 steppers at LAAS (FDLS 2007) 0441.jpg 3,872 × 2,592; 3.78 MB
  
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  MA-6 & MJB-3 steppers at LAAS 0455.jpg 3,872 × 2,592; 3.77 MB
  
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  Mask illustration.svg 1,112 × 930; 12 KB
  
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  Micro-PL polarization spectrum.png 700 × 551; 65 KB
  
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  Micro-PL setup scheme.png 923 × 462; 27 KB
  
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  Micro-PL spectrum.png 575 × 585; 66 KB
  
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  Negatiivlakk.png 1,148 × 289; 124 KB
  
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  Negative photoresist.png 1,094 × 293; 41 KB
  
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  Negra Baiana Liberta, 1845.png 2,383 × 2,477; 12.46 MB
  
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  NovolakCresol.png 2,185 × 930; 101 KB
  
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  Off-axis illumination shapes DE.svg 411 × 396; 26 KB
  
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  OpcedPhotomask.png 2,079 × 2,077; 40 KB
  
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  OpcedPhotomask.svg 744 × 1,052; 64 KB
  
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  Optical proximity correction DE.svg 500 × 450; 9 KB
  
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  Optical proximity correction structures DE.svg 730 × 300; 9 KB
  
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  Optical proximity correction structures.svg 730 × 300; 8 KB
  
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  Overlay - reticle rotation.svg 920 × 1,000; 15 KB
  
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  Overlay - wafer rotation.svg 920 × 1,000; 14 KB
  
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  Overlay examples box-in-box (DE).svg 469 × 537; 13 KB
  
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  Overlay tragets.svg 301 × 260; 32 KB
  
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  Overlay vektor map - wafer rotation error DE.svg 920 × 920; 26 KB
  
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  Phase Shift Mask (4 types) N.PNG 1,500 × 700; 84 KB
  
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  Phase-shift illustration.png 485 × 485; 5 KB
  
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  Phase-shifting mask illustration.svg 917 × 1,746; 23 KB
  
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  Photolithographie 1.png 698 × 245; 6 KB
  
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  Photolithographie 2 - expostion.png 698 × 354; 9 KB
  
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  Photolithographie 3 - après développement.png 698 × 210; 5 KB
  
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  Photolithography lab in the LCN cleanroom.jpg 3,872 × 2,592; 4.05 MB
  
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  Photolithography overlay error (DE).svg 903 × 489; 16 KB
  
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  Photolithography Process (5941061782).jpg 607 × 204; 45 KB
  
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  Photolithography process.png 1,264 × 568; 102 KB
  
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  Photolithography.tif 1,265 × 1,328; 206 KB
  
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  Photomask.JPG 3,888 × 2,592; 3.92 MB
  
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  Photon Energy vs Resolution.PNG 441 × 377; 7 KB
  
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  Photoresist bilayer double patterning.png 1,256 × 627; 27 KB
  
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  Photoresist of Photolithography.png 1,265 × 1,329; 87 KB
  
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  Photoresist Scheme.png 1,265 × 1,324; 87 KB
  
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  Photoresist spin coating.jpg 3,452 × 1,594; 1.82 MB
  
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  PL setup scheme.png 815 × 480; 21 KB
  
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  Porownanie negatywowego i pozytywowego fotorezystu.svg 600 × 300; 28 KB
  
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  Positiivlakk.png 1,124 × 307; 138 KB
  
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  Positive photoresist.png 1,104 × 282; 44 KB
  
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  Regular breaks.PNG 130 × 154; 1 KB
  
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  Retrospective de Michel ROBARDET.jpg 456 × 397; 50 KB
  
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  Rochester Institute of Technology 28.jpg 1,257 × 843; 203 KB
  
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  Schéma procesu fotolitografie.png 4,429 × 1,820; 174 KB
  
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  Scientist in the LCN cleanroom photolithography lab.jpg 3,192 × 2,316; 1.92 MB
  
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  Self-aligned (spacer) double pattering (SaDP).svg 580 × 503; 20 KB
  
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  Semiconductor photomask.jpg 2,000 × 2,000; 2.72 MB
  
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  Simple model of 4 types semiconducter lithography lighting.PNG 1,080 × 500; 60 KB
  
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  Simple model of Scanner (Semiconducter lithography).PNG 580 × 820; 87 KB
  
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  Spacer Quadrupling.PNG 825 × 529; 14 KB
  
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  Step and Repeat DE.svg 200 × 300; 43 KB
  
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  Step and Scan DE.svg 200 × 300; 44 KB
  
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  Step Fotolitografia.jpg 960 × 720; 32 KB
  
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  Stereo photolithography.png 1,771 × 1,535; 220 KB
  
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  SÜSS MicroTec MA6 Mask Aligner.jpg 1,442 × 980; 150 KB
  
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  Trench doubling.JPG 393 × 488; 11 KB
  
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  Trench doubling.svg 392 × 487; 3 KB
  
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  Tritone Phase Shift Mask.svg 338 × 242; 29 KB
  
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  Ty-LithographyAndPatternTransferByEtching-de.svg 953 × 589; 28 KB
  
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  Ty-LithographyAndPatternTransferByEtching-nl.svg 953 × 589; 28 KB
  
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  Umkehrbelichtung (Halbleitertechnik).svg 1,075 × 850; 61 KB
  
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  Vegleich Positiv- und Negativlack.svg 600 × 300; 27 KB
  
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  مقایسه لاک مثبت و منفی.svg 600 × 300; 27 KB