File:Origin of residual stress.tif
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Origin of residual stress in films
Summary
[edit]DescriptionOrigin of residual stress.tif |
English: Origin of residual stress in thin films: a) Lattice mismatch, b) thermal difference, and c) intrinsic. |
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Date | ||||
Source | Adapted from: ] M. Birkholz with contributions by Paul F. Fewster and Cristoph Genzel. Thin Film Analysis by X-Ray Scattering. Wiley-VCD Verlag GmbH & Co. (2005). | |||
Author | Carlos Torres | |||
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 06:17, 24 May 2019 | ![]() | 653 × 681 (66 KB) | Charlygtc12 (talk | contribs) | User created page with UploadWizard |
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Width | 653 px |
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Height | 681 px |
Compression scheme | LZW |
Pixel composition | RGB |
Number of components | 4 |
Number of rows per strip | 4 |
Horizontal resolution | 150 dpi |
Vertical resolution | 150 dpi |
Data arrangement | chunky format |