File:Ways the GPC in ALD can vary with cycles.png

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Illustration of characteristic ways the growth per cycle (GPC) in atomic layer deposition (ALD) can vary with cycles

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English: Illustration of different characteristic ways the growth per cycle (GPC) in atomic layer deposition (ALD) can vary with cycles: (a.1) constant GPC; (a.2) substrate-enhanced growth, with GPC that is higher in the beginning; (a.3) Type 1 substrate-inhibited growth, where GPC is lower in the beginning; and (a.4) Type 2 substrate-inhibited growth, where GPC is small in the beginning, increases often with a quadratic dependency on the cycle number, and later levels off to a constant value, optionally after going through a maximum. The characteristic shape of the growth curve resulting from the growth in panels (a.1)-(a.4), is illustrated in panel (b). Classification as in Journal of Applied Physics 97, 121301 (2005); https://doi.org/10.1063/1.1940727.
Date
Source Own work
Author Riikka L. Puurunen, J. Ruud van Ommen

This image is an updated version of an earlier representation of the dependency of the GPC on the number of reaction cycles in different types of ALD processes, which was published in a scientific review article: Puurunen, Journal of Applied Physics, volume 97, article number 121301 (year 2005), Figure 15; https://doi.org/10.1063/1.1940727.

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