File:Scheme area selective ALD.png

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Captions

Captions

Illustration of area-selective atomic layer deposition (ASALD)

Summary[edit]

Description
English: Illustration of area-selective atomic layer deposition (ASALD): (a) surface with chemically dissimilar areas, where ALD growth occurs (growth area) or does not readily occur (non-growth area); (b) surface where a blocking agent has been selectively adsorbed on the non-growth area; and (c) surface after completion of ASALD, where material has grown only on the targeted growth area. If the difference in selectivity between the two areas is large enough, a blocking agent is not needed and step (b) can be skipped.

Based on: A. J. M. Mackus, M. J. M. Merkx, and W. M. M. Kessels, “From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity,” Chem. Mater., vol. 31, no. 1, pp. 2–12, Jan. 2019, doi: 10.1021/acs.chemmater.8b03454.

Fenne van Ommen is acknowledged for help with drawing this image.
Date
Source Own work
Author J. Ruud van Ommen, Riikka L. Puurunen

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current05:13, 22 December 2020Thumbnail for version as of 05:13, 22 December 20203,071 × 822 (834 KB)Jrvanommen (talk | contribs)Uploaded own work with UploadWizard

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