File:KO fig21 applications Corelv11.png

English: Schematics of some of the main commercial applications of atomic layer deposition (ALD): (a) Thin Film Electroluminescent Display; (b) 3-D Dynamic Random Access Memory; (c) metal-oxide-semiconductor field-effect transistor; (d) write and read head of a hard disk; (e) silver coin; (f) passivated emitter and reactor contact cell (photovoltaic cell).

More background info in: M. Ritala and M. Leskelä, “Chapter 2 - Atomic layer deposition,” in Handbook of Thin Films, H. Singh Nalwa, Ed. Burlington: Academic Press, 2002, pp. 103–159. S. K. Kim, S. W. Lee, J. H. Han, B. Lee, S. Han, and C. S. Hwang, “Capacitors with an Equivalent Oxide Thickness of <0.5 nm for Nanoscale Electronic Semiconductor Memory,” Adv. Funct. Mater., vol. 20, no. 18, pp. 2989–3003, 2010. K. E. Williams, “Hard disk-drive technology revolutionizes processing,” Solid State Technol., vol. 47, no. 9, pp. S21–S21, 2004. S. Maat and A. C. Marley, “Physics and Design of Hard Disk Drive Magnetic Recording Read Heads,” in Handbook of Spintronics, Y. Xu, D. D. Awschalom, and J. Nitta, Eds. Dordrecht: Springer Netherlands, 2016, pp. 977–1028.

B. Macco, B. W. van de Loo, and W. M. Kessels, “Atomic layer deposition for high efficiency crystalline silicon solar cells,” in Atomic Layer Deposition in Energy Conversion Applications, Wiley, 2017, pp. 41–99.