File:Illustration of the ALD temperature window.png

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Captions

Captions

Illustration of the atomic layer deposition (ALD) temperature window concept, originally developed by Tuomo Suntola

Summary[edit]

Description
English: Illustration of the ALD temperature window concept. Inside the ALD window (gray area), the process fulfils the criteria of ALD. Outside the ALD window, the process fails to fulfil the ALD criteria, because of: (L1) reversible multilayer adsorption (physisorption); (L2) activated chemisorption, not saturated; (H1) thermal decomposition of the reactant; or (H2) desorption due to reversible reactions. Adapted from T. Suntola, Materials Science Reports, Vol. 4, Issue 5, 1989, Pages 261-312, Figure 12, https://doi.org/10.1016/S0920-2307(89)80006-4.
Date
Source Own work
Author Riikka L. Puurunen, J. Ruud van Ommen

Various illustrations of the ALD window concept have been published in the ALD literature since Tuomo Suntola originally gradually developed the concept in the 1980s and published it in 1989 in a form essentially the same as the current illustration. For some reason, although later representations have not added essential new contents to the original concept, usually, a reference to the original source has not been included. The field of ALD should be aware of the original source of the ALD window concept: T. Suntola, Materials Science Reports, Vol. 4, Issue 5, 1989, Pages 261-312, Figure 12, https://doi.org/10.1016/S0920-2307(89)80006-4.

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