File:EUV 10nm node pattern shift through focus.png

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EUV_10nm_node_pattern_shift_through_focus.png ‎(532 × 216 pixels, file size: 21 KB, MIME type: image/png)

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Description
English: Best focus differs between two adjacent features due to the non-telecentricity of the illumination, as exhibited by the different shifts for different illuminations. Ref.: IMEC/ASML, 2015 International Symposium on Extreme Ultraviolet Lithography.
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This diagram was created with Microsoft Excel.
Author Guiding light

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Guiding light at English Wikipedia, the copyright holder of this work, hereby publishes it under the following licenses:
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Original upload log[edit]

The original description page was here. All following user names refer to en.wikipedia.
Date/Time Dimensions User Comment
2017-04-30 03:04:41 532 × 216 Guiding light New picture
2016-11-28 12:01:31 571 × 289 Guiding light Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]]
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Date/TimeThumbnailDimensionsUserComment
current21:33, 20 August 2019Thumbnail for version as of 21:33, 20 August 2019532 × 216 (21 KB)OgreBot (talk | contribs)(BOT): Reverting to most recent version before archival
21:33, 20 August 2019Thumbnail for version as of 21:33, 20 August 2019571 × 289 (7 KB)OgreBot (talk | contribs)(BOT): Uploading old version of file from en.wikipedia; originally uploaded on 2016-11-28 12:01:31 by Guiding light
16:28, 20 August 2019Thumbnail for version as of 16:28, 20 August 2019532 × 216 (21 KB)Dave louis john (talk | contribs)Transferred from en.wikipedia (MTC!) (1.1.0)

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