File:3-ALD-reaction-schemes.png

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Captions

Captions

Simplified reaction scheme illustration for three typical atomic layer deposition (ALD) processes: (a) Me3Al/H2O to grow Al2O3, (b) HfCl4/H2O to grow HfO2, and (c) MeCpPtMe3/O3 to grow Pt

Summary[edit]

Description
English: Simplified reaction scheme illustration for three typical atomic layer deposition (ALD) processes: (a) Me3Al/H2O to grow Al2O3, (b) HfCl4/H2O to grow HfO2, and (c) MeCpPtMe3/O3 to grow Pt
Date
Source Own work
Author J. Ruud van Ommen, Riikka L. Puurunen

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current04:52, 22 December 2020Thumbnail for version as of 04:52, 22 December 20202,691 × 1,743 (187 KB)Jrvanommen (talk | contribs)Uploaded own work with UploadWizard

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