File:28 nm pitch aggressive multipatterning.png

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Captions

Captions

At ~30 nm pitch, both DUV and EUV approaches require multiple patterning

Summary

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Description
English: At ~30 nm pitch, both immersion DUV and EUV approaches require multiple patterning (in this case, four exposures and three exposures, respectively). DUV faces optical resolution limits, while EUV faces stochastic defect issues[1] and illumination constraints.[2][3]
Date
Source Own work
Author Guiding light

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I, the copyright holder of this work, hereby publish it under the following license:
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References

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  1. ↑ S. Kang et al., Proc. SPIE 11611, 1161129 (2021).
  2. ↑ D. Rio et al., Proc. SPIE 11609, 116090T (2021).
  3. ↑ J-H. Franke et al., Proc. SPIE 11517, 1151716 (2020).

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Date/TimeThumbnailDimensionsUserComment
current21:20, 14 March 2021Thumbnail for version as of 21:20, 14 March 2021869 × 552 (7 KB)Guiding light (talk | contribs)pitch
21:15, 14 March 2021Thumbnail for version as of 21:15, 14 March 2021869 × 552 (20 KB)Guiding light (talk | contribs)pitch
16:25, 13 March 2021Thumbnail for version as of 16:25, 13 March 2021869 × 552 (20 KB)Guiding light (talk | contribs)corrected label of one part
16:17, 13 March 2021Thumbnail for version as of 16:17, 13 March 2021869 × 552 (20 KB)Guiding light (talk | contribs)Uploaded own work with UploadWizard

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