File:21 nm pattern-dependent SMO.png
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Summary[edit]
| Description |
English: A 21 nm half-pitch metal layer pattern and a 21 nm via layer pattern have different optimized illuminations due to different pattern densities. Ref.: W. Gao et al., Proc. SPIE vol. 10143, 101430I (2017). |
| Date | |
| Source | Graphic editor |
| Author | Guiding light |
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User:Guiding light, the copyright holder of this work, hereby publishes it under the following licenses:
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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Transferred from en.wikipedia to Commons using For the Common Good.
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| Date/Time | Dimensions | User | Comment |
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| 04:12, 26 May 2017 | 773 × 332 (128,934 bytes) | w:en:Guiding light (talk | contribs) | Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]] |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 15:18, 29 September 2018 | | 773 × 332 (126 KB) | Arlene the bean (talk | contribs) | Transferred from en.wikipedia: see original upload log above |
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