File:Синтез фотонных материалов для Индустрии 4.0.jpg
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DescriptionСинтез фотонных материалов для Индустрии 4.0.jpg |
English: FMN Laboratory engineer in the process of forming specialized materials for ultra-low loss photonic integrated circuits on silicon wafers. The creation of such materials is possible only at high temperatures in the media provided in vacuum chambers by the supply of gases with a very low content of impurities. Photonic integrated circuits are a key platform for the upcoming Industry 4.0, as well as for creating precision industrial and biological sensors, alone with devices for ultra-fast information processing.
Русский: Сотрудник НОЦ ФМН в процессе формирования специализированных материалов для фотонных интегральных схем со сверхнизкими потерями на кремниевых пластинах. Создание таких материалов возможно только при высоких температурах в средах, обеспечиваемых в вакуумных камерах подачей газов с очень малым содержанием примесей. Фотонные интегральные схемы используются в Индустрии 4.0, для создания прецизионных сенсоров и датчиков, а также устройств сверхбыстрой обработки информации. English: FMN Laboratory engineer in the process of forming specialized materials for ultra-low loss photonic integrated circuits on silicon wafers. The creation of such materials is possible only at high temperatures in the media provided in vacuum chambers by the supply of gases with a very low content of impurities. Photonic integrated circuits are a key platform for the upcoming Industry 4.0, as well as for creating precision industrial and biological sensors, alone with devices for ultra-fast information processing. |
Date | |
Source | Own work |
Author | FMNLab |
Photoshoot taken at the Bauman Moscow State Technical University
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I, the copyright holder of this work, hereby publish it under the following license:
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This image was uploaded as part of Russian Science Photo Competition 2023.
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 20:07, 31 May 2023 | 6,000 × 4,000 (3.89 MB) | FMNLab (talk | contribs) | Uploaded own work with UploadWizard |
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Camera manufacturer | Canon |
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Camera model | Canon EOS R |
Author | Kushlevich Sergey |
Copyright holder |
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Exposure time | 1/1,250 sec (0.0008) |
F-number | f/1.4 |
ISO speed rating | 1,600 |
Date and time of data generation | 15:44, 9 February 2022 |
Lens focal length | 50 mm |
Horizontal resolution | 320 dpi |
Vertical resolution | 320 dpi |
Software used | Adobe Photoshop Lightroom Classic 11.0 (Windows) |
File change date and time | 23:11, 20 February 2022 |
Exposure Program | Manual |
Exif version | 2.31 |
Date and time of digitizing | 15:44, 9 February 2022 |
APEX shutter speed | 10.287712 |
APEX aperture | 0.970854 |
APEX exposure bias | 0 |
Maximum land aperture | 1 APEX (f/1.41) |
Metering mode | Pattern |
Flash | Flash did not fire |
DateTimeOriginal subseconds | 44 |
DateTimeDigitized subseconds | 44 |
Color space | sRGB |
Focal plane X resolution | 1,866.6666564941 |
Focal plane Y resolution | 1,866.6666564941 |
Focal plane resolution unit | 3 |
Custom image processing | Normal process |
Exposure mode | Manual exposure |
White balance | Manual white balance |
Scene capture type | Standard |
Serial number of camera | 063022002126 |
Lens used | 50.0 mm |
Date metadata was last modified | 02:11, 21 February 2022 |
Unique ID of original document | B2BD7252FAD223F735D8447648864AAF |
IIM version | 4 |