File:Thin film growth defect.jpg
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| Description |
English: During the thin film deposition by MOCVD it is possible to form a film with a small lattice. In this case the upper film will face tensile stress and will seek a way to get rid of it. This film have tried to avoid being stressed by forming several pillars of material. Maybe the reason is an accidental particle in the center. |
| Date | |
| Source | Own work |
| Author | Evavilova |
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I, the copyright holder of this work, hereby publish it under the following license:
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This image was uploaded as part of Wiki Science Competition 2017. |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 10:33, 12 December 2017 | | 1,280 × 960 (162 KB) | Evavilova (talk | contribs) | User created page with UploadWizard |
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