File:Strati di ossido di silicio ottenuti per ossidazione termica.jpg
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| Description |
Italiano: strati di ossido di silicio accresciuti per ossidazione termica, alternativamente, di tipo wet e dry |
| Date | |
| Source | Own work |
| Author | Ilaria Lucresi |
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I, the copyright holder of this work, release this work into the public domain. This applies worldwide. In some countries this may not be legally possible; if so: I grant anyone the right to use this work for any purpose, without any conditions, unless such conditions are required by law. |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 09:04, 13 March 2009 | | 530 × 323 (14 KB) | Ilaria Lucresi (talk | contribs) | {{Information |Description={{it|1=strati di ossido di silicio accresciuti per ossidazione termica, alternativamente, di tipo wet e dry}} |Source=Own work by uploader |Author=Ilaria Lucresi |Date=2009-03-13 |Permission= |other_versi |
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