File:Silicon doping - Type P.svg
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Size of this PNG preview of this SVG file: 326 × 288 pixels. Other resolutions: 272 × 240 pixels | 543 × 480 pixels | 869 × 768 pixels | 1,159 × 1,024 pixels | 2,318 × 2,048 pixels.
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[edit]DescriptionSilicon doping - Type P.svg |
العربية: تشويب السيلكون بذرات عنصر ثلاثي التكافؤ من أجل تشكيل شبه موصل مشوب من النوع بي.
English: Silicon doping to create extrinsic semiconductor type P. |
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Date | ||||||||||||||||||
Source | Robert Boylestad, Louis Nashelsky (1998).Electronic Devices and Circuit Theory (PDF) (7th Edition). Prentice Hall. P.9. ISBN 013769282X. | |||||||||||||||||
Author |
creator QS:P170,Q81411358 |
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[edit]I, the copyright holder of this work, hereby publish it under the following license:
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 20:13, 9 April 2019 | 326 × 288 (171 KB) | Michel Bakni (talk | contribs) | Fix font type | |
07:19, 24 November 2018 | 326 × 288 (52 KB) | Michel Bakni (talk | contribs) | User created page with UploadWizard |
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Width | 326.39999 |
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Height | 288 |