File:Silicene-Ag STM2.jpg

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Description STM images of silicene on ultra-thin (a, b) 20 ML and (c) 11.9 ML Ag films. After Si deposition for 60 min at (a) ca. 550 K and (b) ca. 600 K. The deposition rate was 0.02 ML/min. Vs = +2.0 V and I = 0.1 nA. The image size is 16 × 16 nm. (c) After Si deposition for 15 min at 600 K. The Si rate was 0.08 ML/min. Vs = +2.0 V and I = 0.1 nA. The image size is 16 × 16 nm. The black arrows indicate the Ag[1-10] direction.
Date Published 17 September 2014
Source http://iopscience.iop.org/1367-2630/16/9/095004/article
Author Junki Sone et al.
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current07:27, 15 January 2015Thumbnail for version as of 07:27, 15 January 20151,785 × 558 (655 KB)Materialscientist (talk | contribs){{Information |Description=STM images of silicene on ultra-thin (a, b) 20 ML and (c) 11.9 ML Ag films. After Si deposition for 60 min at (a) ca. 550 K and (b) ca. 600 K. The deposition rate was 0.02 ML/min. Vs = +2.0 V and I = 0.1 nA. The image size is...

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