File:SID-SIM-SID SAQP LE Asymmetric.png
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Summary
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| Description |
English: The horizontal 30 nm pitch requires SAQP while the vertical 40 nm pitch requires SADP. With EUV, the two different pitches would require different source illuminations and hence different masks,* i.e., LELE double patterning would be needed. On the other hand, the spacer sequence allows the use of one cut mask for this pattern, rather than several. Blue: core; Green: 2nd spacer; Yellow: 3rd spacer gap; Red: block. * Ref.: R-H. Kim et al., Proc. SPIE vol. 9776, 97761R (2016). |
| Date | |
| Source | Excel drawing |
| Author | Guiding light |
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Guiding light at English Wikipedia, the copyright holder of this work, hereby publishes it under the following licenses:
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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The original description page was here. All following user names refer to en.wikipedia.
| Date/Time | Dimensions | User | Comment |
|---|---|---|---|
| 2017-06-11 01:01 | 601×378× (7648 bytes) | Guiding light | Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]] |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
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| current | 04:28, 12 July 2017 | | 601 × 378 (7 KB) | Daylen (talk | contribs) | Transferred from en.wikipedia |
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