File:Reflectance for narrowband EUV.png
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![File:Reflectance for narrowband EUV.png](https://upload.wikimedia.org/wikipedia/commons/thumb/3/34/Reflectance_for_narrowband_EUV.png/800px-Reflectance_for_narrowband_EUV.png?20190720195357)
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For different EUV wavelengths, the multilayer reflectance dependence on incident angle varies significantly.
Summary
[edit]DescriptionReflectance for narrowband EUV.png |
English: Left: For shorter wavelengths, the multilayer reflectance increases for larger incident angles. Center: The reflectance appears fairly uniform across a range of angles for a narrow band of wavelengths. Right: For longer wavelengths, the reflectance peaks at smaller incident angles.[1] Insets show the resulting corresponding distributions of reflectance across the pupil, also known as mask-induced apodization,[2] for 13.4 nm (left), 13.5 nm (center), and 13.65 nm (right), respectively. |
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Source | Own work |
Author | Guiding light |
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References
[edit]- ↑ R. Chao et al., Measurement and characterization of EUV mask performance at high-NA, EECS Department, Univ. of California, Berkeley Technical Report No. UCB/EECS-2013-56, 5/10/2013, Figure 5.
- ↑ N. Davydova et al., Proc. SPIE 8166, 816624 (2011).
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 19:53, 20 July 2019 | ![]() | 1,276 × 252 (110 KB) | Guiding light (talk | contribs) | Insets for pupil gradients |
02:35, 20 July 2019 | ![]() | 1,276 × 254 (61 KB) | Guiding light (talk | contribs) | additional ranges | |
01:37, 20 July 2019 | ![]() | 521 × 312 (8 KB) | Guiding light (talk | contribs) | User created page with UploadWizard |
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