File:Photolithography etching process-ru.svg

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English: Simplified illustration of dry etching using positive photoresist during a photolithography process in semiconductor microfabrication. Note: Not to scale.
Deutsch: Vereinfachte Darstellung des Trockenätzens einer Oxidschicht mithilfe eines Fotolithografieprozesses mit positivem Fotoresist. Hinweis: Nicht maßstabsgetreu.
Русский: Упрощённая схема сухого травления оксида на кремнии с использованием позитивного фоторезиста
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Source File:Photolithography etching process.svg by Cmglee
Author Д.Ильин: translation
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I, the copyright holder of this work, hereby publish it under the following license:
Creative Commons CC-Zero This file is made available under the Creative Commons CC0 1.0 Universal Public Domain Dedication.
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Date/TimeThumbnailDimensionsUserComment
current20:54, 28 March 2022Thumbnail for version as of 20:54, 28 March 2022748 × 1,173 (56 KB)Lxlalexlxl (talk | contribs)File uploaded using svgtranslate tool (https://svgtranslate.toolforge.org/). Added translation for uk.
21:08, 10 May 2020Thumbnail for version as of 21:08, 10 May 2020748 × 1,173 (29 KB)Д.Ильин (talk | contribs)Fix number, removing background
20:03, 10 May 2020Thumbnail for version as of 20:03, 10 May 2020748 × 1,173 (28 KB)Д.Ильин (talk | contribs)Uploaded own work with UploadWizard

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