File:POR litho barrier.PNG
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Summary
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| Description |
English: * KrF: 248 nm excimer laser
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| Date | 9 October 2009 (original upload date) |
| Source | Transferred from en.wikipedia to Commons. |
| Author | Guiding light at English Wikipedia |
Licensing
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Guiding light at English Wikipedia, the copyright holder of this work, hereby publishes it under the following licenses:
This file is licensed under the Creative Commons Attribution-Share Alike 3.0 Unported, 2.5 Generic, 2.0 Generic and 1.0 Generic license.
Attribution: Guiding light at English Wikipedia
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- share alike – If you remix, transform, or build upon the material, you must distribute your contributions under the same or compatible license as the original.
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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Original upload log
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The original description page was here. All following user names refer to en.wikipedia.
| Date/Time | Dimensions | User | Comment |
|---|---|---|---|
| 2009-10-09 07:15 | 784×366× (20256 bytes) | Guiding light | * KrF: 248 nm excimer laser * ArF: 193 nm excimer laser * OPC: [[Optical proximity correction]] * immersion: [[immersion lithography]] * RET: Resolution enhancement technique, such as [[phase shift mask]] * 45 nm: [[45 nm]] lithography technology * DP: [[ |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 10:08, 28 February 2016 | | 784 × 366 (20 KB) | FastilyClone (talk | contribs) | Transferred from enwp |
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