File:Microchip for Carbon Nanotube Field Effect Transistors fabrication.jpg
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[edit]DescriptionMicrochip for Carbon Nanotube Field Effect Transistors fabrication.jpg |
English: Scanning Electron Microscopy image of a die with Carbon Nanotubes based Field Effect Transistors to be fabricated. Image obtained during one of the fabrication steps, after hydrofluoric (HF) acid wet etching and SF6 based Inductively Coupled Plasma dry etching steps. Glowing structures in the middle are charged photoresist residues. In this chip design each square test pad represents transistor's source or drain electrodes, across which single-walled Carbon Nanotube will be suspended during the subsequent fabrication stages. Scale: the width of the outermost square test pads is 150 micrometers. SEM image and fabrication by Aidar Kemelbay (NLA, Nazarbayev University), with the help of Dr. Emine Cagin (NTB Buchs, Switzerland) performed at FIRST - Center for Micro- and Nanoscience, ETH Zurich. Photolithography mask design - Dr. Kiran Chikkadi (ETH Zurich, MNS group). |
Date | |
Source | Own work |
Author | Aidar Kemelbay |
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[edit]I, the copyright holder of this work, hereby publish it under the following license:
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This image was uploaded as part of European Science Photo Competition 2015. |
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 18:34, 8 January 2016 | 1,009 × 701 (481 KB) | Kemelbaydar (talk | contribs) | User created page with UploadWizard |
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Width | 1,024 px |
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Height | 768 px |
Compression scheme | Uncompressed |
Pixel composition | Palette |
Orientation | Normal |
Number of components | 1 |
Horizontal resolution | 72 dpi |
Vertical resolution | 72 dpi |
Software used | Adobe Photoshop CS6 (Macintosh) |
File change date and time | 00:18, 9 January 2016 |
Color space | Uncalibrated |
Date and time of digitizing | 17:44, 8 January 2016 |
Date metadata was last modified | 06:18, 9 January 2016 |
Unique ID of original document | xmp.did:F87F117407206811871FA5ACE803A7A3 |