File:EUV Stochastic Limits.png

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Description Stochastic defects limit the resolution of EUV. At 36 nm pitch, the defect rate does not drop below a floor level ~1e-9. Unopened trenches at larger pitches become less likely at larger widths, while broken resist lines at dense pitches become more likely at the same time. Stochastic defects apply to contact as well as line patterns. Ref.: P. De Bisschop and E. Hendrickx, Proc. SPIE 10957, 109570E (2019).
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Author Guiding light

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Guiding light at English Wikipedia, the copyright holder of this work, hereby publishes it under the following licenses:
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The original description page was here. All following user names refer to en.wikipedia.
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2019-04-15 14:56:39 767 × 630 Guiding light
2019-04-15 13:01:30 1486 × 326 Guiding light
2019-04-14 10:15:46 377 × 326 Guiding light
2019-04-13 15:57:48 377 × 326 Guiding light Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]]
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current16:02, 2 April 2020Thumbnail for version as of 16:02, 2 April 2020767 × 630 (30 KB)Hippymoose17 (talk | contribs)Transferred from en.wikipedia (MTC!) (1.1.0)

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