File:Depth-of-focus.JPG
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| Description |
English: This is a plot showing the depth of focus, measured in nanometers, as a function of numerical aperture, for the currently considered leading edge lithography tools. KrF means 248 nm wavelength, ArF means 193 nm wavelength, and EUV means 13.5 nm wavelength. "Wet" means water is used as the imaging medium (n=1.44), while "Dry" means air is used (n=1). EUV requires a vacuum for the imaging medium (n=1). The depth of focus formula used is 0.25*wavelength/(sin(angle/2))^2, where angle corresponds to the numerical aperture. |
| Date | 13 January 2008 (original upload date) |
| Source | Transferred from en.wikipedia to Commons. |
| Author | Guiding light at English Wikipedia |
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Guiding light at English Wikipedia, the copyright holder of this work, hereby publishes it under the following licenses:
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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Original upload log
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The original description page was here. All following user names refer to en.wikipedia.
| Date/Time | Dimensions | User | Comment |
|---|---|---|---|
| 2008-01-13 10:39 | 417×251× (14922 bytes) | Guiding light | This is a plot showing the depth of focus, measured in nanometers, as a function of numerical aperture, for the currently considered leading edge lithography tools. KrF means 248 nm wavelength, ArF means 193 nm wavelength, and EUV means 13.5 nm wavelength |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 10:06, 28 February 2016 | | 417 × 251 (15 KB) | FastilyClone (talk | contribs) | Transferred from enwp |
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