File:ASML EUVL blurred NILS.PNG

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Description
English: Data from ASML presentation at International Workshop on EUVL, Maui 2010: J. Benschop, "EUV: Status and Challenges Ahead". The decreasing NILS (normalized image log slope) indicates decreasing quality of the lithographic patterning. 2 is the ideal value for acceptable printing,[1] although values as low as 1.3 could be used in current production.[2]

The ADT (Alpha Demo Tool) and MET (Micro-Exposure Tool) were installed for learning purposes only, while the NXE:3300 is ASML's targeted production tool.

References

  1. O. Wood and B. LaFontaine, Source Power Requirement for HVM.
  2. US Patent 6977715.
Date 19 August 2010 (original upload date)
Source Transferred from en.wikipedia to Commons.
Author Guiding light at English Wikipedia

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Guiding light at English Wikipedia, the copyright holder of this work, hereby publishes it under the following licenses:
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Original upload log

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The original description page was here. All following user names refer to en.wikipedia.
Date/Time Dimensions User Comment
2010-08-29 17:19 803×546× (19764 bytes) Guiding light Updated data from International Workshop on EUVL, 2010 (J. Benschop).
2010-08-19 15:09 677×400× (11211 bytes) Guiding light Data from ASML presentation at Semicon West 2010: "EUVL - getting ready for volume introduction," H. Meiling, July 14, 2010.

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Date/TimeThumbnailDimensionsUserComment
current07:24, 13 March 2016Thumbnail for version as of 07:24, 13 March 2016803 × 546 (19 KB)OgreBot (talk | contribs)(BOT): Reverting to most recent version before archival
07:24, 13 March 2016Thumbnail for version as of 07:24, 13 March 2016677 × 400 (11 KB)OgreBot (talk | contribs)(BOT): Uploading old version of file from en.wikipedia; originally uploaded on 2010-08-19 15:09:35 by Guiding light
10:08, 28 February 2016Thumbnail for version as of 10:08, 28 February 2016803 × 546 (19 KB)FastilyClone (talk | contribs)Transferred from enwp

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