File:30 nm pitch different dipoles different shifts.png

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30_nm_pitch_different_dipoles_different_shifts.png ‎(502 × 288 pixels, file size: 16 KB, MIME type: image/png)

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English: Dipole illumination from dipoles at different pupil positions will cause the EUV pattern to shift, due to different shifts upon reflection from the EUV multilayer mask.[1][2]
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Author Guiding light

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  1. ↑ Pattern Shifts Induced by Dipole-Illuminated EUV Masks.
  2. ↑ S. Sherwin et al., "Advanced multilayer design to mitigate EUV shadowing," Proc. SPIE 10957, 1095715 (2019).

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current12:11, 18 December 2021Thumbnail for version as of 12:11, 18 December 2021502 × 288 (16 KB)Guiding light (talk | contribs)Uploaded own work with UploadWizard

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