File:Μem EM Microelectronic die H1053S001S.jpg

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English: Unknown CMOS IC fabbed and designed by µem. Mask design could be from 1993. "P.N" and "V.M" are likely the initials of the designers. The size of the die itself (edge of the outermost metallization layer) is about 2.6x3.5 mm (9.1 mm²).
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Author Phiarc
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Laowa at 5:1. Since coaxial lighting is impossible with a camera lens I put a diffuse light source next to the lens and angled the wafer such that the light source is reflected into the lens. This gives a similar but worse result than true coaxial light would and requires some minor processing for a rectangular image. That's also why 100+ images are stacked for this, since the z-depth between the top and bottom edge is about 1.5 mm.

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current20:32, 27 March 2023Thumbnail for version as of 20:32, 27 March 20233,272 × 4,072 (5.49 MB)Phiarc (talk | contribs)Uploaded own work with UploadWizard

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